Metal sputtering targets are usually made of highly pure metals, are widely used, and fundamental coating materials for other sputter deposition technology. Such sputtering targets such as ultra-pure aluminum, copper, silver, and gold are common in the modern industry. Under the numerical control process and high purity, metal sputtering targets must be as smooth as possible. We offer metal targets in various purity levels to suit customers' specific requirements, with a minimum purity of 99.95% up to 99.99% for some metals like Aluminium, Copper, Molybdenum, and ultra-high purities of 99.99-99.% for Aluminium, Tellurium, Titanium, Cadmium, Silicon, and Molybdenum. However, high purity levels cause an increase in material costs. But, in some cases, the use of low purity material can result in poor film quality.
If you want to learn more, please visit our website Acetron.
AEM has a long and useful experience for all forms of metal sputtering targets production as a senior manufacturer for sputtering targets.
AEM has a solid reputation for its excellent performance. We offer each sputtering target with a certificate of analysis and Safety Data Sheet (SDS). In the below list, you can get all of Pure Metal Sputtering Targets. By clicking the product name, you can get more details, and you can also click "inquiry" to get affordable prices and high quality.
AEM Deposition, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film.
For your custom R&D, production materials need or if you do not find the sputtering target as per your need from the list. Contact us via at [ protected] or call us at +86-731-.
If you want to learn more, please visit our website Rotary Metal Sputtering Targets.
We also offer in-house, sputter target bonding services. You can click the link: Target Bonding to know more.
For Frequently Asked Questions (FAQ) about Sputtering Targets, please visit this link: Sputtering Targets FAQ.
We are a sputtering target manufacturer, located in Columbus, Ohio. We are equipped to provide standard vacuum deposition materials as well as custom sputtering target stoichiometries & geometries. Our five industrial vacuum hot presses, along with our mills, kilns, and spray dryer combined with over 35 years of experience mean industry leaders looking for consistency, and capability choose us. Our academic and collegiate customers appreciate our ability to produce small-batch research-grade sputtering targets with the same proficiency as our industrial sputtering targets. We even offer sputtering target refurbishment, through our Virgin Powder Repress process, on select platinum group metals (PGMs), and compounds like Indium Tin Oxide (ITO).
If you have a rotatable indium-bonded target assembly, with a target that is at its end of life, we can help you save money on a new indium bond. Indium (In) is an expensive metal. We take your old assembly, de-bond the used target, reclaim the indium, and pass the savings onto you for your new rotatable target assembly.
We understand that different sputtering systems require tailored cathode designs, which is why we ensure that our high-purity sputtering targets are machined to your specifications. Although some of our targets do not require conductive bonded assembly, we are proficient in carrying out indium bonding in-house for others. In addition, our specialized quality control department employs state-of-the-art C-Scan systems to identify voids in both rotatable and planar targets. This eliminates any potential issues with your PVD process, ensuring that you receive only the very best quality sputtering targets.